研究论文
Dry development in lithography: Molecular design and chemical strategies
Kangsik Lee, Juchan Chung, Hyo Jae Yoon
Korea University
来源Advances in Colloid and Interface Science
年份2026
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逐年被引趋势
320
326
关键指标
3
被引次数 · OpenAlex
9.19
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同类平均 = 1
同类平均 = 1
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学术脉络
学科主题
工程Advancements in Photolithography Techniques
Nanofabrication and Lithography Techniques · Copper Interconnects and Reliability
参考文献 50
Integrated Silylation and Dry Development of Resist for sub-0.15.MU.m Top Surface Imaging Applications.
被引 4Johan Vertommen, Walter Klippert, Anne-Marie Goethals · Journal of Photopolymer Science and Technology · 1998
Stable Phenoxy-radicals
被引 28Vitalii D Pokhodenko, V. A. Khizhnyi, V. A. Bidzilya · Russian Chemical Reviews · 1968
Beyond EUV lithography: a comparative study of efficient photoresists' performance
被引 152Nassir Mojarad, J. Gobrecht, Yasin Ekinci · Scientific Reports · 2015
此处列出前 3 条
引用本文 3
Competing Sn–Oand Sn–C Bond CleavagePathways Control Cross-Linking in Tin-Oxo Clusters
被引 0Taoli Guo, Chen Zhu, Lei Zhang · The Journal of Physical Chemistry Letters · 2026
Recent efforts of vapour-phase strategies for EUV resist toward high- and hyper-NA extreme ultraviolet lithography
被引 0Thi Thu Huong Chu, Dan N. Le, Minjong Lee · Chemical Science · 2026
Azide-Functionalized Organotin Carboxylate Lithography Resist
被引 0Tae Hyun Kwon, Seoyoon Chang, Eunsoo Hong · ACS Applied Nano Materials · 2026
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