研究论文

Study and optimization of room temperature inductively coupled plasma etching of InP using Cl2/CH4/H2 and CH4/H2

Chee-Wei Lee, Duan Nie, Tengda Mei, M.K. Chin

Nanyang Technological University

来源Journal of Crystal Growth

年份2006

DOI10.1016/j.jcrysgro.2005.12.058

原文https://doi.org/10.1016/j.jcrysgro.2005.12.058

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Semiconductor materials and devices

Nanowire Synthesis and Applications · Silicon Nanostructures and Photoluminescence

参考文献 28

Inductively coupled plasma etching of InP using N2/H2

Hsin‐Yi Chen, Harry E. Ruda, Alvaro Zapata Navarro · Journal of Applied Physics · 2001

被引 7

High rate CH4:H2 plasma etch processes for InP

C.S. Whelan, T.E. Kazior, Katerina Y. Hur · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1997

被引 25

Fabrication of InP Submicron Pillars for Two-Dimensional Photonic Crystals by Reactive Ion Etching

Hitoshi Hatate, Masayuki Hashimoto, Hirofumi Shirakawa · Japanese Journal of Applied Physics · 1998

被引 15

此处列出前 3 条

引用本文 19

Integrated Lasers on Silicon at Communication Wavelength: A Progress Review

Nanxi Li, Guanyu Chen, Doris K. T. Ng · Advanced Optical Materials · 2022

被引 66

Review of Short-Wavelength Infrared Flip-Chip Bump Bonding Process Technology

Junhao Du, Xuewei Zhao, Jiale Su · Sensors · 2025

被引 23

Inductively coupled plasma deep etching of InP/InGaAsP in Cl2/CH4/H2 based chemistries with the electrode at 20 °C

Andreas Wieczorek, Vladimir Djara, Frank H. Peters · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2012

被引 13

按被引量排序，此处列出前 3 条