研究论文
Ellipsometric and XPS characterization of transparent nickel oxide thin films deposited by reactive HiPIMS
Duc Tuong Nguyen, A. Ferrec, Julien Kéraudy, Mireille Richard‐Plouet, A. Goullet, L. Cattin, Luc Brohan, Pierre-Yves Jouan
Centre National de la Recherche Scientifique Institut des Matériaux Jean Rouxel Nantes Université
来源Surface and Coatings Technology
年份2014
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材料 / 化学ZnO doping and properties
Transition Metal Oxide Nanomaterials · Thin-Film Transistor Technologies
参考文献 13
Deposition of nickel oxide by direct current reactive sputtering
被引 43A. Karpinski, A. Ferrec, Mireille Richard‐Plouet · Thin Solid Films · 2011
Parameterization of the optical functions of amorphous materials in the interband region
被引 2,307G. E. Jellison, F. A. Modine · Applied Physics Letters · 1996
Effect of heat treatment on the properties of non-stoichiometric p-type nickel oxide films deposited by reactive sputtering
被引 139Jiin-Long Yang, Yi‐Sheng Lai, Jen‐Sue Chen · Thin Solid Films · 2005
此处列出前 3 条
施引文献 23
Polyol derived Ni and NiFe alloys for effective shielding of electromagnetic interference
被引 87Kesavapillai Sreedeviamma Dijith, R Aiswarya, Mathew Praveen · Materials Chemistry Frontiers · 2018
The effect of the oxygen ratio control of DC reactive magnetron sputtering on as-deposited non stoichiometric NiO thin films
被引 67Mengying Wang, Yohann Thimont, Lionel Presmanes · Applied Surface Science · 2017
Nitrogen doping on NiO by reactive magnetron sputtering: A new pathway to dynamically tune the optical and electrical properties
被引 46Julien Kéraudy, A. Ferrec, Mireille Richard‐Plouet · Applied Surface Science · 2017
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