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Extreme ultraviolet lithography
Dimitrios Kazazis, Jara G. Santaclara, Jan van Schoot, Iacopo Mochi, Yasin Ekinci
Paul Scherrer Institute ASML (Netherlands)
来源Nature Reviews Methods Primers
年份2024
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逐年被引趋势
64320
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124
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14.96
领域内被引倍数
同类平均 = 1
同类平均 = 1
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学术脉络
学科主题
工程Advancements in Photolithography Techniques
Nanofabrication and Lithography Techniques · Integrated Circuits and Semiconductor Failure Analysis
参考文献 102
EUV photomask defects: what prints, what doesn't, and what is required for HVM
被引 12Jed Rankin, Zhengqing John Qi, Mark Lawliss · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015
Novel negative-tone molecular resist based on polyphenol derivative for extreme ultraviolet lithography
被引 13Hiroaki Oizumi, Takafumi Kumise, Toshiro Itani · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2008
EUV Resist Process Performance Investigations on the NXE3100 Full Field Scanner
被引 30Anne-Marie Goethals, Philippe Foubert, Kohei Hosokawa · Journal of Photopolymer Science and Technology · 2012
此处列出前 3 条
引用本文 124
Sustainable Transition of the Global Semiconductor Industry: Challenges, Strategies, and Future Directions
被引 44Yilong Yin, Yi Yang · Sustainability · 2025
Review of Industrialization Development of Nanoimprint Lithography Technology
被引 31Yuanxun Cao, Dongxin Ma, Haiming Li · Chips · 2025
Super-resolution laser machining
被引 27Jiaxu Huang, Kang Xu, Shaolin Xu · International Journal of Machine Tools and Manufacture · 2025
按被引量排序，此处列出前 3 条