High quality factor Er3+-activated dielectric microcavity fabricated by rf sputtering
Alessandro Chiasera, Romina Belli, S.N.B. Bhaktha, Andrea Chiappini, Maurizio Ferrari, Y. Jestin, E. Moser, Giancarlo Cesare Righini 等 9 位
Istituto di Fotonica e Nanotecnologie University of Trento
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The authors report on one-dimensional dielectric photonic crystals activated by Er3+ ion and fabricated by rf-sputtering deposition. The cavity was constituted by an Er3+-doped SiO2 active layer inserted between two Bragg reflectors consisting of six pairs of SiO2∕TiO2 layers. Near infrared transmittance spectra evidence the presence of a stop band from 1350to1850nm and a cavity resonance centered at 1537nm. Intensity enhancement and narrowing of the I13∕24→I15∕24 emission band of Er3+ ion, due to the cavity effect, were observed. A cavity quality factor of 171 was achieved.
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物理Photonic Crystals and Applications
Photonic and Optical Devices · Photorefractive and Nonlinear Optics
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