Electric field reconfiguration in W/ β -Ga2O3 Schottky barrier diodes under negative bias stress
Jiamin Liao, Xiang Zheng, Yibo Wang, Xiaole Jia, Haodong Hu, Cizhe Fang, Hongrui Zhang, Bochang Li 等 11 位
Xidian University
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摘要与影响
In this work, the characteristics of W/Ga2O3 Schottky barrier diodes with Al2O3 passivation under negative bias stress (NBS) are investigated. Interestingly, the NBS treatment yields a significant 91% reduction in reverse leakage current (Ileakage) and a 29.7% enhancement in breakdown voltage (Vbreakdown), with negligible impact on forward I–V characteristics. The observed behavior is attributed to electron trapping near the anode edge, with an activation energy of 0.44–0.49 eV and approximately 0.75 eV. Technical computer-aided design simulations validate that the trapped negative charges function as a virtual field plate, which redistributes the electric field and mitigates the field peak at the anode edge. Our findings highlight a reversible field-modulation mechanism via interface charge engineering, offering insights into the reliability and performance optimization of Ga2O3-based power electronics.
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材料 / 化学Ga2O3 and related materials
GaN-based semiconductor devices and materials · Thin-Film Transistor Technologies
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