Laser-Induced Damage in Dielectrics with Nanosecond to Subpicosecond Pulses
Brent C. Stuart, M. D. Feit, Alexander M. Rubenchik, Bruce W. Shore, M. D. Perry
Lawrence Livermore National Laboratory
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We report extensive measurements of damage thresholds for fused silica and calcium fluoride at 1053 and 526 nm for pulse durations $\ensuremath{\tau}$ ranging from 270 fs to 1 ns. Qualitative differences in the morphology of damage and a departure from the diffusion-dominated ${\ensuremath{\tau}}^{1/2}$ scaling indicate that damage results from plasma formation and ablation for $\ensuremath{\tau}\ensuremath{\le}10$ ps and from conventional melting and boiling for $\ensuremath{\tau}>100$ ps. A theoretical model based on electron production via multiphoton ionization, Joule heating, and collisional (avalanche) ionization is in good agreement with experimental results.
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工程Laser Material Processing Techniques
Laser-induced spectroscopy and plasma · Laser-Matter Interactions and Applications
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