Antiferroelectric hafnia down to the 2D limit
Xin Li, Guodong Ren, Haidong Lu, Kartik Samanta, Amit Kumar Shah, Kai Huang, Pravan Omprakash, Yu Yun 等 19 位
University of Nebraska–Lincoln Washington University in St. Louis Jaypee Institute of Information Technology Oak Ridge National Laboratory
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摘要与影响
Antiferroelectricity is a material property characterized by alternating electric dipoles spontaneously ordered in antiparallel directions. Antiferroelectrics are promising for energy storage, solid-state cooling, and memory technologies; however, these materials are scarce, and their scalability remains largely unexplored. In this work, we demonstrate that single-crystalline hafnia, a lead-free CMOS-compatible material, exhibits antiferroelectricity under compressive-strain conditions. We observe antiparallel sublattice polarization and stable double-hysteresis in single-crystalline (111)-oriented epitaxial La-doped hafnia films grown on yttrium-stabilized zirconia and show that the antipolar orthorhombic phase of hafnia adheres to the Kittel model of antiferroelectricity. Notably, compressive strain strengthens the orthorhombic order in thinner La-doped hafnia films, achieving a very high ordering temperature of 850°C in the two-dimensional limit, highlighting hafnia's potential for advanced antiferroelectric devices.
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工程Ferroelectric and Negative Capacitance Devices
Ferroelectric and Piezoelectric Materials · Multiferroics and related materials