A novel approach of thick coating through selective jet electrodeposition process
Anand Mohan Pandey, Sajan Kapil, Manas Das
Indian Institute of Technology Guwahati
内容与影响
Selective Jet Electrodeposition (SJED) emerges as a cutting-edge Additive Manufacturing technology, offering the ability to produce metallic components at both nano and micro scales. In SJED, metallic deposition occurs atom by atom, showcasing potential applications for electroplating (coating) purposes. Achieving a smooth and void-free coating necessitates optimisation of layer height, width and the centre distance between two adjacent beads. An ANOVA study is performed to identify the most impactful input process parameters among source voltage, scan speed and frequency. It evaluates their contribution to the output responses (layer height and width). Furthermore, Response Surface Methodology is performed to obtain the optimal parameters to achieve maximum layer height and minimum layer width. Additionally, multi-bead optimisation is performed to achieve a flat surface condition. Subsequently, a coating is carried out using a toolpath, and a comparative analysis is conducted with the conventional coating method in terms of mechanical properties. The SJED-based coating exhibits superior characteristics compared to conventional coating.
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工程Electrodeposition and Electroless Coatings
Metal and Thin Film Mechanics · Nanomaterials and Printing Technologies
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