Investigation of Surface Defects in Optical Components Based on Reflection Mueller Matrix Spectroscopy
Ruyi Li, Feibin Wu, Huiling Huang, Weibin Cai, Yantong Zhang, Jun Han
Tan Kah Kee Innovation Laboratory Fuzhou University Chinese Academy of Sciences Quanzhou Institute of Equipment Manufacturing Haixi Institute
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摘要与影响
Nanoscale defects on the surface of ultra-precision optical elements seriously affect the beam quality in optical systems. In response to the challenge of detecting nanoscale defects on optical component surfaces, we propose a method for the detection and classification of various types of defects on optical component surfaces via reflection Mueller matrix spectroscopy (RMMS). Firstly, an electromagnetic scattering theoretical model for various types of defects on the surface of optical elements and the incident and scattered fields were established by combining the bidirectional reflection distribution function (BRDF) and the Rayleigh–Rice vector scattering theory. Then, the optimal conditions for RMMS measurements were determined by numerically simulating the BRDF. On this basis, the surface roughness and pockmarks of the optical test plate were simulated and analyzed via RMMS, and the results were verified experimentally; then, dirty particles and pockmarks above the surface of the optical element and subsurface bubble defects (SSBD) were simulated and analyzed via RMMS. The results showed that some elements of the Mueller matrix could significantly distinguish defects on the surface of the optical element with dimensions smaller than the visible wavelength, and the dimensions of various types of defects of the element could be inverted using the values of the Mueller matrix elements. This method provides a theoretical basis and reference for the detection and classification of various types of defects in precision optical components.
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工程Surface Roughness and Optical Measurements
Optical Polarization and Ellipsometry · Optical measurement and interference techniques
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