Recent Advances in a-IGZO Thin Film Transistor Devices: A Short Review
Jingwen Chen, Fucheng Wang, Yifan Hu, Jaewoong Cho, Yeojin Jeong, Duy Phong Pham, Junsin Yi
Sungkyunkwan University
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摘要与影响
In recent years, the transparent amorphous oxide thin film transistor represented by indium-gallium-zinc-oxide (IGZO) has become the first choice of the next generation of integrated circuit control components. This article contributes an overview of IGZO thin-film transistors (TFTs), including their fundamental principles and recent advancements. The paper outlines various TFT structures and places emphasis on the fabrication process of the active layer. The result showed that the size of the active layer including the length-to-width ratio and the width could have a significant effect on the mobility. And the process of TFT could influence the crystal structure of IGZO thin film. Furthermore, the article presents an overview of recent applications of IGZO TFTs, such as their use in display drivers and TFT memories. At last, the future development of IGZO TFT is forecasted in this paper.
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工程Thin-Film Transistor Technologies
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